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Poly-silicon plasma etching for solar cell production has earned the reputation of being fast, reliable and above all economical. Plasma etching has proven itself as the most effective method to date for edge isolation and back-side nitride or PSG-removal. Along with very high etching rates, the direct microwave plasma technology keeps the cell temperature at a low level avoiding thermal stress. Improved stacking and loading accessories help to simplify the cell handling.

Solar Cell Etching

	In the production of silicon and germanium crystals with the Czochralski method, crystal pulling equipment is used. This type of equipment mainly varies in size and thus in crystal diameter and length.

	GIGA 690 Solar       The Microwave Plasma System PS 400/660 Solar is a dedicated and reliable plasma system widely used in solar cell manufacturing for edge isolation. ... more