Crystal Pulling Systems (Czochralski process)

 

Production systems for silicon and germanium (using the Czochralski process)

 

In the production of silicon and germanium crystals with the Czochralski method, crystal pulling equipment is used. This type of equipment mainly varies in areas basically correlated to crystal diameter and length, but all systems have the following features in common:

 

• Modular structure of the system enables it to be used, without major adaptation, for semiconductor silicon, solar silicon or germanium crystal pulling
• Possibility for development of basic processes for the next wafer generation
• Double-walled furnace of high-alloy stainless steel with mirror-polished surface for easy cleaning
• Simple furnace handling for cleaning/process set-up
• An isolation valve between furnace and receiving chamber enables the removal of crystals while the melt remains at process temperature
• High-precision regulation of the melt bath temperature
• Crystal drive unit using shaft or cable, direct drive units with maintenance-free motors and speed control with high precision
• Control of the entire process by programmable logic controller (PLC) and software for process data acquisition and analysis, incl. graphic online display of process data and option for comparing with previous processes
• possibility of adding optional components, such as magnet for stabilising the melt bath, recharging unit (feeder), or devices to control the melt bath height

 

 

 

The Czochralski process in its various phases

1. melting	2. temperature stabilisation	3. accretion of seed crystal
4. pulling the neck of the crystal	5. growth of shoulder	6. growth of body

 

 

	CGS-Lab     Our Czochralski Crystal Growing System for the production of silicon crystals up to 100mm diameter and 300mm length in laboratories ... more

 

 

	SolarCrystallizer 22       Our solar Czochralski-Puller for mass production of silicon crystals up to 230mm diameter ... more

 

	Typ EKZ 2700 These equipments combine proven mechanical elements with innovative elements for process control. The two plant types differ primarily in the design of crystal drive unit (shaft/cable) and are used for the production of crystals with up to 6” diameter. The dimension of these furnaces allow ...   more

 

	Typ EKZ 3500 The EKZ 3500/200 is used to produce crystals up to 200mm in diameter. The typical batch weights range between 120 and 150kg, depending on the hot zone installed and the use of feeder for increasing the batch weight. The crystal lengths obtainable from such batch sizes measure about 1.5m in the cylindrical portion....  more

 

	Typ EKZ 3000 Compared to the crystal pulling equipment used until now, the concept and design of the 300mm plant signify a quantum leap. In developing the plant, consideration was given to all knowledge gained to date and to the available know-how of our customers worldwide. These furnaces provide ideal conditions for meeting crystal quality requirements. ... more

 

 

 

Your service contact

 

PVA TePla AG
Im Westpark 10 - 12
35435 Wettenberg

+49 (0) 641/68690-0
E-Mail: info@pvatepla.com

 

 

 

 

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