Typ Delta

This low-pressure/low-temperature equipment is designed for chemical vapor deposition (CVD) of SiGe or SiGe:C onto silicon wafers of 200 and 300mm diameter. The modular system with vertically arranged reactor is intended for cassette-to-cassette operation.

The specific advantages of this system, compared to systems designed for other process methods, are its universal range of applications (SiGe/SiGe:C/Si for flash epi), high productivity (approx. 50 wafers/hr) and yield, and its selective growth option. Like all CGS products, this system excels through the use of high-quality materials worked to highest standards.