Material Solutions

CVD Reactor

Numerous processes and equipments have already been developed for customers for advanced coating materials such as:

  • TiC, TiN, Ti(C,N)
  • PyC, SiC, B₄C, TiB₂, BN, B, Al₂O₃, AlN
  • W, Re, ZrC, TaC, HfC
  • DLC, ZnS, ZnSe
  • Doped aluminizing
  • TCO
Next
chemical vapor deposition furnace in a industrial surrounding
Technical Data
Available chamber diameter (mm)600, 900, 1,200, 1,600, 2,500
Max. temperature (°C)1,600 (option 2,200)
Heating zones3 to 4
Base pressure (mbar)0.02
Reactor typeBottom loading
Turntable with adjustable speed (RPM)0.1 to 3
Gas system and liquid source dosingN₂, H₂, CH₄, MTCS, SiCl₄
Gas abbatmentWet scrubber

 

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