Chemical Vapor Deposition

The Chemical Vapor Deposition (CVD) process enables the development of advanced ceramic materials, either as high‑density coatings or as self‑standing monoliths with outstanding physical properties. This technology, already proven in a wide range of key applications, offers significant growth potential in vital industries. With rapidly developing economies worldwide, it is evident that CVD processes are poised for substantial global expansion.

The CVD process integrates multiple scientific and engineering disciplines. Innovation is at the core of our work.

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The process

Chemical Vapor Deposition is a process of formation of a non-volatile solid film on a substrate from the reaction of vapor phase chemical reactants containing the right proportion of constituents and depending on:

Chemical reactions
Reactor type and geometry
Process parameters (temperature, pressure, flow rate and time)
Transport phenomena (mass and heat)
Kinetics and thermodynamics

Elementary steps in a cvd reactor

Handling of precursor materials, some of which are liquid
Introduction of reactive species into the reactor
Diffusion and adsorption of reactants onto the surface
Chemical reaction at the surface, forming the solid material
Desorption of byproducts from the surface
Diffusion of byproducts and unreacted reactants away from the surface, followed by the transport of byproducts out of the reactor

Each of these steps requires specialized engineering expertise.

chemical vapor deposition furnace in a industrial surrounding

Relevant industries

Semiconductor

Chemical Vapor Deposition (CVD) of SiC is important for graphite suppliers in the semiconductor industry for several key reasons:

Creation of high-purity SiC coatings
Contamination prevention
Enhanced performance and longevity
Critical for advanced semiconductor processes
Customization and precision

The feed gases are typically SiCl₄ (STC), CH₄, and H₂, or alternatively SiCH₃Cl₃ (MTS) and H₂. The reaction takes place at approximately 1,350°C and at pressures of a few hundred mbar.

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Automotive

Our CVD technologies, including fluidized bed reactors, enable precise, uniform coating of battery anode materials (such as silicon-graphite composites) to enhance capacity, cycle life, and overall performance while mitigating issues like volume expansion.

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Aerospace & Defense

The CVD process can be used to produce extremely adhesive and temperature-resistant ceramic coatings.
These reliably protect components against wear, corrosion and thermal stress - ideal for use in defense systems, such as heat shields, sensors or engine components.

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Our CVD system

chemical vapor depositon furnace in an industrial surrounding

CVD Reactor

These reactors operate from vacuum until atmospheric pressure, in a wide range of temperatures from 500 to 2,200°C. The diameter of these reactors is included between 100 mm and 3,000 mm for the useful zone.
In most cases, CVD applications operate under vacuum conditions, typically from 10⁻² mbar to several hundred mbar, by using a mix of reactant gases.

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