Plasma Application and Process Support

Our frontend lab includes a class 100 cleanroom where multiple configurations of our latest batch and single‑wafer systems are in operation. These tools are used for applications such as photoresist removal, stretch‑relief etching, and other frontend plasma processes.

Our frontend team provides hands‑on guidance to help you optimize critical plasma steps and achieve stable, repeatable results. We work closely with you to refine processes, validate parameters, and ensure reliable performance for your frontend applications.

Our backend area features batch and single‑substrate plasma tools with microwave and high‑frequency (>13.56 MHz) excitation. A dedicated system for solar cell edge etching is also available, supporting a wide range of industrial applications.

Our backend specialists support you in developing and improving plasma processes for advanced device structures. From troubleshooting to process enhancement, we help you achieve high‑quality results and secure consistent performance in your backend workflows.

Metrology system support, including laser‑based and surface contamination analysis, is provided at our Jena (Germany) laboratory, ensuring precise characterization for your materials and components.

Our metrology experts assist you in evaluating materials, interpreting results, and tailoring measurement strategies to your needs. We ensure that your characterization processes deliver clear, actionable insights for confident decision‑making.