Ellipsometry

Ellipsometry delivers unrivaled, absolute accuracy in characterizing thin films by measuring changes in the polarization state, of reflected light. This technology provides highly detailed information on the properties of bulk materials, single layers, and complex multilayer stacks with exceptional depth and accuracy. Such insights are crucial for ensuring the quality, performance, and long‑term reliability of multilayer thin‑film structures across a wide range of semiconductor applications.

Products Contact

Advanced Ellipsometry Technology

Ellipsometry is an optical measurement technology that analyzes how polarized light changes after reflecting from a surface. It enables extremely precise determination of thin film thickness — often down to the sub nanometer range— and delivers highly accurate characterization of optical functions and material properties, making it essential for advanced semiconductor processes.

As a nondestructive technique, it delivers reliable metrology data for yield optimization and process control in next‑generation semiconductor manufacturing.

The Process

Ellipsometry characterizes thin films by directing polarized light onto a sample at a defined angle. When the light reflects from the surface and any underlying layers, its polarization state changes due to differences in layer thickness, the refractive index (n) and the extinction coefficient (k).

The system measures the resulting polarization change using the ellipsometric parameters Psi (Ψ) and Delta (Δ), which describe amplitude ratio and phase shifts between the light’s p- and s-polarized components.

The measured data are then analyzed using optical models. Through this fitting process, ellipsometry determines: thin-film thicknesses, refractive indices and extinction coefficients, material composition and multilayer stack properties.

To summarize, ellipsometry is a highly sensitive, nondestructive optical measurement technique used to characterize thin-film systems in semiconductor and advanced materials processes.

Typical applications

Measurement of thickness and optical properties of thin films on semiconductor wafers
Characterization of dielectrics, metals, and semiconductor layers
Process control in development and high-volume manufacturing
Thin film validation and material characterization

Inspection of a wafer with PVA TePla LuXpector Thea

Relevant industries

Semiconductor

Ellipsometry provides precise thin‑film and refractive‑index measurements essential for controlling critical FEOL and BEOL process steps.

More about the industry

Photovoltaics

Ellipsometry analyzes absorber, passivation, and conductive layers to optimize solar cell efficiency and production yield.

Optics

Dielectric and anti‑reflection coatings are precisely characterized to ensure exact optical performance across complex multilayer stacks.

Power Electronics

Power devices such as SiC, GaN, IGBTs, and MOSFETs rely on precisely controlled dielectric, passivation, and interface layers, making accurate thin‑film metrology essential. Ellipsometry provides this precision by measuring critical materials like SiO₂, Si₃N₄, Al₂O₃, gate oxides, buffer layers, and passivation films. This capability is especially important for wide‑bandgap technologies like SiC and GaN, which demand highly accurate optical models and advanced thin‑film characterization for reliable high‑power performance.

System overview

LuXpector THEA is a high‑throughput, fully automated thin‑film measurement system designed for leading‑edge semiconductor and power electronics applications. It delivers precise characterization of thin films, dielectric layers, passivation coatings, and complex multilayer structures with exceptional accuracy and stability.
Its versatility and precision make it an ideal solution for fabs working with Si, SiC, GaN, and other advanced material platforms, supporting the increasingly demanding requirements of next‑generation device manufacturing.

System at a glance

LuXpector THEA

LuXpector THEA (Tool for High-precision Ellipsometry Analysis) combines ellipsometry and reflectometry in a compact, cost-effective and fast system for accurate thin-film characterization in semiconductor manufacturing.
Designed for both R&D and production environments, it delivers reliable and high measurement accuracy of even complex layer systems, with minimal effort in operation and maintenance.

More about the system

Interested in Ellipsometry?

Get in touch

Contact Form