Advantages

GIGAbatch 310M

  • Compact table-top design
  • Economic price level
  • Versatility in substrate sizes (2" to 6")
  • Batch processing (Up to 25 wafers per run)
  • Custom wafer boat support arms (optional)
  • Manual drawer door
  • Microwave plasma source
  • Fast ash rate & damage-free process
  • Broad substrate compatibility
Next
Giga Batch frontend plasma system with open chamber door showing wafers inside.
Technical data
Frequency2.45 GHz
Power0-600 W
Electrical conn.230 V, 15 A, 50/60 Hz
Vacuum chamberQuartz, diameter 245 mm, depth 395 mm, volume 18 l
Dimensions (w/h/d)Approx. 795 x 660 x 710 mm
Weight150 kg

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