Available systems

PlaTeG.Nitride

Mono-Plant:
• Low-cost entry option
• One complete chamber
• One middle anode (mountable/dismountable)
• Option for shuttle and tandem

Shuttle-Plant:
• Best value for money
• Integrated chamber transfer
• One chamber with two chamber bottoms
• One middle anode (mountable/dismountable)
• Option for tandem

Tandem-Plant:
• High efficiency
• Two complete chambers
• Two middle anodes (mountable/dismountable)
• 24/7 operation with two shifts over five workdays

Multiple PulsPlasma® nitride treatment systems aligned in a production facility showing piping and control panels

Technical data

Size	200	280
Pulse current PP generator [A]	60	60
Charge weight max. [kg]	500	750
Usable dim. max. (ØxH) [mm]	600 x 700	600 x 1,000
Usable volume [l]	200	280
Temperature range [°C]	350-600	350-600

Size	600	700
Pulse current PP generator [A]	120	120
Charge weight max. [kg]	2,000	2,000
Usable dim. max. (ØxH) [mm]	800 x 1,200	800 x 1,400
Usable volume [l]	600	700
Temperature range [°C]	350-600	350-600

Size	1350	2250	4400
Pulse current PP generator [A]	200	300	500
Charge weight max. [kg]	3,000	5,000	8,000
Usable dim. max. (ØxH) [mm]	1,000 x 1,700	1,200 x 2,000	1,600 x 2,200
Usable volume [l]	1,350	2,250	4,400
Temperature range [°C]	350-600	350-600	350-600

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