VEreveal

• Inline inspection system built for semiconductor fab environments (ISO class 3)
• Available for macro inspection (macro), micro inspection (micro), or both combined (fusion)
• Near real-time acquisition and evaluation, designed for continuous production monitoring
• Full-surface (100%) wafer inspection in a single run
• Replaces multiple measurement methods: eliminates the need for separate FT-IR, SEM, LIBS, X-ray, or AFM measurements
• Spatial resolution from 300 µm (macro) down to sub-micron (micro)
• Supports wafer sizes up to 300 mm
• Certified to SEMI S2, S8, and S14 standards
• Versatile customization options