Technische Daten
| Messmodus | Reflexion |
| Messzeit | < 10 s |
| Wellenlängenbereich | VNIR: 400–1.000 nm | SWIR 1: 900–1.700 nm |
| Spektrale Auflösung | VNIR: 1,34 nm | SWIR: 3,5 nm |
Interesse an VEpioneer?
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The PVA TePla VEpioneer MICRO is a specialized metrology system designed for precise inspection tasks within semiconductor equipment environments.
A PVA TePla metrology unit designed for semiconductor equipment analysis, showing a scanning sensor positioned over a wafer stage.
This PVA TePla system is designed for semiconductor metrology, featuring a glass chamber that houses a wafer for precise inspection.
| Messmodus | Reflexion |
| Messzeit | < 10 s |
| Wellenlängenbereich | VNIR: 400–1.000 nm | SWIR 1: 900–1.700 nm |
| Spektrale Auflösung | VNIR: 1,34 nm | SWIR: 3,5 nm |
Interesse an VEpioneer?